treatment equipment for wafer process (electronic circuit forming)

Categories:
Categories:
General Machinery/Special Industry Machinery/semiconductor manufacturing equipment
Location:
JP - Japan
Reference year: 2000 - 2010
Description

This unit process represents the production/service of 1P of treatment equipment for wafer process (electronic circuit forming) ,in Japan created from statistical information and other sources.
This product includes Annealing Device, Wet Etching Equipment, Electron Beam Exposure Apparatus, Wafer Heat Treatment Apparatus . The system boundary of this process is "(special steel stainless steel and plastic products for electric machinery and appliance etc.) -> processing/assembly."
Pure water production equipment are classified as <2678>.Design equipment is classified as <2829>.Testing equipment (electrical measuring instrument) is classified as <2751>.

Technology

The average production method in Japan in 2010 is assumed.

Process type
Unit
Supported nomenclature
Other, ECOSPOLD2
LCI modeling approach
Attributional
Multifunctional modeling
CAUSAL
Format
Other
Aggregation type
UNKNOWN
Data provider
IDEA
Review status
Internal
Cost
For sale
License

Full unit process access.

Contact
support (at) idea-lca.jp